Project Brief
Vaudreuil - Quebec
The project consisted of the conversion of three “bay and chase” tunnels into a 5,000 sq. ft. “ballroom” cleanroom. The space was conceived as a class 1,000 (ISO 6) cleanroom with a class 100 (ISO 5) photo lithography area for the production of 75 mm GaAs wafers. Operations included thinning, diffusion, Plasma Enhanced Chemical Vapour Deposition (PECVD), metallization and QC testing.
Building Data
3500000
Construction Costs
5000
Building Area (Square Feet)
2002
Date of Completion